Reports suggest that Samsung will introduce High-NA EUV lithography machines from ASML in early 2025

Zhitong
2024.10.30 06:27

According to reports citing sources, Samsung Electronics will introduce the first High-NA EUV lithography machine EXE:5000 from ASML, expected to arrive in early 2025. Semiconductor equipment installation typically requires a longer testing period, with the lithography machine expected to start operation as early as mid-2025. High-NA EUV is equipment required for advanced processes below 2 nanometers, and the South Korean industry expects Samsung to officially commence the commercialization process of 1-nanometer chips

Source: Zhitong The copyright of this article belongs to the original author/organization.
The views expressed herein are solely those of the author and do not reflect the stance of the platform. The content is intended for investment reference purposes only and shall not be considered as investment advice. Please contact us if you have any questions or suggestions regarding the content services provided by the platform.